Imaging spectroscopic ellipsometry delivers nanometer-level sensitivity and spatial resolution, addressing the limitations of conventional metrology techniques.

Abstract: This work presents an overview of the latest advancements in monochromatic ellipsometry, tracing its evolution from early null ellipsometry to widely commercialized rotating ellipsometry, ...

Polarization describes the orientation of electromagnetic waves as they propagate through space, representing one of light's fundamental properties alongside wavelength and intensity. In spectroscopy, ...

A new technical paper titled “Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology” was published by researchers at Samsung. “We propose an ultra-wide-field ...

insights from industryDr. Max Junda & Dr. Lyle GordonSenior Member of the Technical Staff and Director of MaterialsCovalent Metrology In this interview, AZoMaterials speaks with Dr. Max Junda, Senior ...

Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...

SENTECH Instruments, a supplier of plasma process technology equipment for etching and deposition and thin film metrology instruments based on spectroscopic ellipsometry has announced the new ...